专利名称：Flow sensor and manufacturing method
therefor
发明人：Ike, Shinichi,Hatakeyama, Hiroshi,Tsuchiya,
Satoshi
申请号：EP08007978.3申请日：20080425公开号：EP2040045A3公开日：20100526
专利附图：
摘要：There is provided a flow sensor configured as described below. The flow sensor11 is formed by bonding a sensor chip 12 formed with a flow rate detecting part 23 and a
flow path forming member 15 that is provided on the sensor chip and is formed with aflow path for a fluid flowing in the flow rate detecting part to each other on the uppersurface of a substrate 21. The flow path forming member is formed by bonding atransparent first flow path forming member 14 and a second flow path forming member15 to each other. The first flow path forming member has a plate shape, and is providedwith an inflow port 14c and a outflow port 14d for the fluid to be measured, and thesecond flow path forming member has a plate shape, and is provided with a through hole15c that forms the flow path along the flow of the fluid flowing along.the flow ratedetecting part. Both ends of the through hole communicate with the inflow port and theoutflow port, and the flow rate detecting part is arranged in the through hole betweenthe portions corresponding to the inflow port and the outflow port to form the flowpath having a predetermined cross-sectional area, whereby the fabrication accuracy ofthe cross-sectional area of sensor flow path is enhanced, and thereby the flow ratedetection accuracy is stabilized.
申请人：Yamatake Corporation
地址：7-3, Marunouchi 2-chome Chiyoda-ku Tokyo 100-6419 JP
国籍：JP
代理机构：Tappe, Hartmut
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