Defect inspection method and system

专利名称：Defect inspection method and system发明人：Sachio Uto,Hiroyuki Nakano,Yukihiro

Shibata,Akira Hamamatsu,Yuta Urano

申请号：US12366956申请日：20090206公开号：US07859656B2公开日：20101228

专利附图：

摘要：An inspection system includes: a facility that uses wide-band illumination lighthaving different wavelengths and single-wavelength light to perform dark-fieldillumination on an object of inspection, which has the surface thereof coated with a

transparent film, in a plurality of illuminating directions at a plurality of illuminatingangles; a facility that detects light reflected or scattered from repetitive patterns andlight reflected or scattered from non-repetitive patterns with the wavelengths thereofseparated from each other; a facility that efficiently detects light reflected or scatteredfrom a foreign matter or defect in the repetitive patterns or non-repetitive patterns or aforeign matter or defect on the surface of the transparent film; and a facility thatremoves light, which is diffracted by the repetitive patterns, from a diffracted light imageof actual patterns or design data representing patterns. Consequently, a moremicroscopic defect can be detected stably.

申请人：Sachio Uto,Hiroyuki Nakano,Yukihiro Shibata,Akira Hamamatsu,Yuta Urano

地址：Yokohama JP,Chigasaki JP,Fujisawa JP,Yokohama JP,Yokohama JP

国籍：JP,JP,JP,JP,JP

代理机构：Antonelli, Terry, Stout & Kraus, LLP.

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