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Process for selective etching of polymeric materia

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专利名称:Process for selective etching of polymeric

materials embodying silicones therein

发明人:Leonard Stein申请号:US05/720584申请日:19760907公开号:US04140572A公开日:19790220

摘要:Titanium is employed as a masking material for the selective etching of acoating material of a polyimide-silicone copolymer disposed on selective surface areas ofelectronic devices.

申请人:GENERAL ELECTRIC COMPANY

代理人:Donald M. Winegar,Joseph T. Cohen,Charles T. Watts

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