专利名称：METHOD FOR MANUFACTURING OPTICAL
INTEGRATED CIRCUITS UTILIZING ANEXTERNAL ELECTRIC FIELD
发明人：SUMIMOTO T,JA,MATSUSHITA
S,JA,YAMAZAKI T,JA,FUJIWARAT,JA,KOIZUMI K,JA
申请号：US33459373申请日：19730222公开号：US3836348A公开日：19740917
摘要：A method for manufacturing optical integrated circuits forms light guide pathsin a substrate by an ionic exchange process. Ions initially present in the substrate arereplaced by ions from a source thereof to locally increase the substrate index ofrefraction, thereby forming light guides, in a pattern dependent upon a mask disposedintermediate the substrate and the ion source.
申请人：NIPPON SELFOC CO LTD,JA
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