专利名称：Grid-based resist simulation发明人：Yuri Granik,Dmitry Medvedev申请号：US11606769申请日：20061129公开号：US07378202B2公开日：20080527
摘要：A grid-based resist simulator predicts how a wafer coated with one or moreresist layers will develop when exposed with a mask pattern. Image intensity values arecalculated at a grid of points on the wafer, and the image intensity points are analyzedwith a resist simulator that produces a resist surface function. A threshold contour of theresist surface function defines how the mask pattern will print on a wafer.
申请人：Yuri Granik,Dmitry Medvedev
地址：Palo Alto CA US,Santa Clara CA US
国籍：US,US
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